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Private Listing: Number 2835 Private  

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Patent Summary

U.S. Patent Classes & Classifications Covered in this listing:

Class 445: Electric Lamp Or Space Discharge Component Or Device Manufacturing

This is the residual and generic class of process and apparatus for the manufacturing, fabrication, repair, salvage, assembly, disassembly or other treatment of an electric lamp, liquid crystal display device or an electric space discharge device which process or apparatus is not elsewhere classified.

Subclass 24: Display or gas panel making
Subclass 50: Emissive type
Subclass 51: Emissive type
Subclass 58: With coating, e.g., providing protective coating on sensitive area

Class 433: Dentistry

This class is a specific class under the broader class of Surgery and includes methods directed to or including specific dental steps, e.g., taking impressions of the teeth or gums, adapting a plate or model to a particular mouth formation, mounting teeth on a plate in a particular way, etc.; apparatus, implements, and devices relating to the treatment of teeth or gums, or the replacement of teeth.

Subclass 165: Tool bit
Subclass 166: Abrading or polishing

Class 216: Etching A Substrate: Processes

Chemical etching processes for treating articles of commerce or intermediate articles not otherwise provided for in which one of the manufacturing steps includes a chemical etching step (use of an etchant) and wherein the material treated is not completely removed.

Subclass 11: FORMING OR TREATING AN ARTICLE WHOSE FINAL CONFIGURATION HAS A PROJECTION
Subclass 41: MASKING OF A SUBSTRATE USING MATERIAL RESISTANT TO AN ETCHANT (I.E., ETCH RESIST)
Subclass 51: Mask resist contains inorganic material
Subclass 81: Etching elemental carbon containing substrate

Class 204: Chemistry: Electrical And Wave Energy

This class includes, where not provided for elsewhere: A. Processes (1) involving the use of electrolysis (as provided for in Class 205); (2) of preparing or purifying compounds or elements involving chemical reaction brought about by electrical or wave energy in a magnetic field; (3) of treating materials involving chemical reaction brought about by wave energy; (4) of preparing or purifying compounds or elements involving chemical reaction brought about by an electrostatic field or electrical discharge; (5) involving the use of electrophoresis or electro-osmosis; (6) of treating a liquid (a) to separate or purify the liquid using electric and magnetic fields simultaneously, (b) to separate or purify the liquid using an electric field, or (c) using a magnetic field to obtain some effect other than mere separation or purification of the liquid; (7) involving coating, forming, or etching by the use of sputtering; and (8) involving coating by the use of vacuum arc discharge.

Subclass 192.1: Coating, forming or etching by sputtering
Subclass 192.15: Specified deposition material or use
Subclass 192.35: Etching specified material
Subclass 298.04: Ion beam sputter deposition
Subclass 298.25: Multi-chamber (e.g., including air lock, load/unload chamber, etc.)
Subclass 298.26: Plural diverse treatment stations, zones, or coating material source within single chamber
Subclass 487: With heat treatment of a coated layer (e.g., curing, sintering, etc.)
Subclass 490: Resultant coating is solely inorganic
Subclass 491: With heat treatment of coating

Class 427: Coating Processes

This is the generic class for: A. applying or obtaining a coating on a surface. The coating may be hard or soft, permanent or transitory, supplied solely by extraneous materials or supplied wholly or in part by the base material. B. impregnating a base by causing a coating material to extend or penetrate into the base material, or into the interstices of a porous, cellular or foraminous material. C. taking preparatory treatments of the base material, subsequent treatments of the coated base material and other ancillary noncoating operations claimed, per se, processes limited to etching for making a base more compatible with, or adherent to, the coating wherein the base is the substrate (work) onto which a coating is applied are included.

Subclass 122: Carbon coating
Subclass 248.1: COATING BY VAPOR, GAS, OR SMOKE
Subclass 249.1: Carbon or carbide coating
Subclass 249.11: Hot filament utilized
Subclass 249.8: Diamond coating
Subclass 250: Metal coating
Subclass 255.18: Silicon containing coating
Subclass 255.19: Metal oxide containing coating
Subclass 255.31: Metal and chalcogen containing coating (e.g., metal oxide, metal sulfide, metal telluride, etc.)
Subclass 255.32: Plural metal containing coating (e.g., indium oxide/tin oxide, titanium oxide/aluminum oxide, etc.)
Subclass 255.37: Silicon dioxide coating
Subclass 256: NONUNIFORM COATING
Subclass 272: Mask or stencil utilized
Subclass 459: Fluidized bed utilized
Subclass 561: Pretreatment of coating supply or source outside of primary deposition zone or off site
Subclass 562: Electric discharge (e.g., corona, glow discharge, etc.)
Subclass 571: With magnetic enhancement
Subclass 580: Electrical discharge (e.g., arcs, sparks, etc.)
Subclass 587: Resistance or induction heating
Subclass 596: Laser or electron beam (e.g., heat source, etc.)
Subclass 77: Electron emissive or suppressive (excluding electrode for arc)
Subclass 78: Vapor deposition or spraying

Class 438: Semiconductor Device Manufacturing: Process

This class provides for manufacturing a semiconductor containing a solid-state device for the following purposes: (a) conducting or modifying an electrical current, (b) storing electrical energy for subsequent discharge within a microelectronic integrated circuit, or (c) converting electromagnetic wave energy to electrical energy or electrical energy to electromagnetic energy. Also operations involving: (1) coating a substrate with a semiconductive material, or (2) coating a semiconductive substrate or substrate containing a semiconductive region. It also provides for operations involving etching a semiconductive substrate or etching a substrate containing a semiconductive region. The class provides for packaging or treatment of packaged semiconductor.

Subclass 20: ELECTRON EMITTER MANUFACTURE

Class 313: Electric Lamp And Discharge Devices

This is the generic class for electric lamp and electric space discharge device structure. Examples of such devices are electric incandescent lamps, gas or vapor filled electric discharge tubes, including lamps, mercury arc devices, vacuum discharge tubes, radio tubes, cyclotrons, cathode-ray tubes, photosensitive discharge devices, secondary emission electron multipliers, spark plugs, and open air arc and spark devices.

Subclass 421: Beam deflecting means
Subclass 495: Vacuum-type tube
Subclass 496: Phosphor on anode segments
Subclass 497: With accelerating or control electrode
Subclass 112: Polarizer or special ray transmission (e.g., filter)
Subclass 292: Supporting and/or spacing elements
Subclass 306: DISCHARGE DEVICES HAVING THREE OR MORE ELECTRODES
Subclass 307: Four or more electrodes
Subclass 308: Discharge control electrode
Subclass 309: DISCHARGE DEVICES HAVING A MULTIPOINTED OR SERRATED EDGE ELECTRODE
Subclass 310: DISCHARGE DEVICES HAVING A THERMIONIC OR EMISSIVE CATHODE
Subclass 311: DISCHARGE DEVICES HAVING AN ELECTRODE OF PARTICULAR MATERIAL
Subclass 336: Point source cathodes
Subclass 346R: Cathodes containing and/or coated with electron emissive material
Subclass 351: Multipointed or serrated edge electrode
Subclass 355: Coated or laminated

Class 257: Active Solid-State Devices (E.G., Transistors, Solid-State Diodes)

This class provides for active solid-state electronic devices, that is, electronic devices or components that are made up primarily of solid materials, usually semiconductors, which operate by the movement of charge carriers - electrons or holes - which undergo energy level changes within the material and can modify an input voltage to achieve rectification, amplification, or switching action, and are not classified elsewhere.

Subclass 10: Low workfunction layer for electron emission (e.g., photocathode electron emissive layer)
Subclass 77: Diamond or silicon carbide
Subclass 627: With specified crystal plane or axis
Subclass 693: External connection to housing
Subclass E23.004: Characterized by shape (EPO)
Subclass E23.068: Additional leads joined to metallizations on insulating substrate, e.g., pins, bumps, wires, flat leads (EPO)
Subclass E23.101: Selection of materials, or shaping, to facilitate cooling or heating, e.g., heat sinks (EPO)
Subclass E23.105: Wire-like or pin-like cooling fins or heat sinks (EPO)

Class 315: Electric Lamp And Discharge Devices: Systems

Electric lamp and electric space discharge device systems: structural combinations with circuit elements; structural combinations with heating and/or cooling means; cathode-ray tubes; lamps and/or discharge devices as sole load devices; lamps; electric space discharge devices gas or vapor discharge devices; high vacuum-type discharge devices, and gas or vapor-type discharge devices claimed broadly; plural load device systems; art uses and combinations with art devices; testing electric lamps and discharge devices; and operating a lamp or a gas or vapor discharge device.

Subclass 39.3: Traveling wave type with delay-type transmission line
Subclass 169.1: Diverse-type energizing or bias supplies to different electrodes
Subclass 169.3: Electroluminescent device
Subclass 169.4: Gas display panel device

Class 345: Computer Graphics Processing And Selective Visual Display Systems

Processes and apparatus for selective electrical control of two or more light-generating or light-controlling display elements* in accordance with a received or stored image data signal. The image data includes character, graphical information or display attribute data. The image data may include, for example, information data from a peripheral input device, from the reception of a television signal, from the recognition of image data, or from the generation or creation of image data by a computer.

Subclass 108: Plural mechanically movable display elements
Subclass 55: Display elements arranged in matrix (e.g., rows and columns)
Subclass 690: Intensity or color driving control (e.g., gray scale)
Subclass 75.2: Field emissive (e.g., FED, Spindt, microtip, etc.)

Class 430: Radiation Imagery Chemistry: Process, Composition, Or Product Thereof

This is the generic class for: (1) Forming the likeness of an object, or an instrumented or discernible phenomenon, in a chemically defined receiver or in a receiver wherein radiation produces a chemical reaction, by use of radiation. (2) Finishing an image by chemical processing regardless how formed. (3) A radiation sensitive receiver, composition, or product disclosed solely for radiation imagery chemistry, and process of making same. (4) A nonradiation sensitive-receiver, composition, or product. (5) An imaged product by a process or employing a receiver, composition, or product.

Subclass 313: With formation of resist image, and etching of substrate or material deposition
Subclass 318: Metal etched
Subclass 320: Making named article
Subclass 323: Including etching substrate

Class 252: Compositions

(A) Compositions of matter, having or not having structure, physical form or heterogeneous arrangement of components and for which there is no provision elsewhere. (B) Packages of such compositions, or other articles which include such compositions for which there is no provision elsewhere. (C) Processes of making, or peculiar to making, such compositions and for which there is no provision elsewhere. (D) Apparatus for use in or peculiar to such processes and for which there is no provision elsewhere.

Subclass 301.4R: INORGANIC LUMINESCENT COMPOSITIONS
Subclass 301.6S: Sulfur containing
Subclass 301.4S: Sulfur containing

Class 349: Liquid Crystal Cells, Elements And Systems

Cells, elements, and systems which include molecules of a material having both liquid and crystalline properties. Included in this class are those which have a significant liquid crystal cell detail or liquid crystal response or properties, and in which the liquid crystal controls or changes the optical properties of electromagnetic radiation such as direction, phase, amplitude, frequency, or polarization state. This class also provides for nominal manufacturing methods for producing significant liquid crystal cell structure.

Subclass 155: Spacer
Subclass 156: Formed as walls (e.g., between pixels) or integral with substrate
Subclass 69: Electroluminescent light source
Subclass 71: Formed of planar phosphor or fluorescent layer separate from illumination source

Class 977: Nanotechnology

This art collection provides for disclosures related to: nanostructure and chemical compositions of nanostructure; device that include at least one nanostructure; mathematical algorithms, e.g., computer software, etc., specifically adapted for modeling configurations or properties of nanostructure; methods or apparatus for making, detecting, analyzing, or treating nanostructure; and specified particular uses of nanostructure. the term "nanostructure" is defined to mean an atomic, molecular, or macromolecular structure that: has at least one physical dimension of approximately 1-100 nanometers; and possesses a special property, provides a special function, or produces a special effect that is uniquely attributable to the structure s nanoscale physical size.

Subclass 742: Carbon nanotubes (CNTs)
Subclass 753: With polymeric or organic binder
Subclass 842: For carbon nanotubes or fullerenes
Subclass 888: Shaping or removal of materials (e.g., etching, etc.)
Subclass 891: Vapor phase deposition
Subclass 939: Electron emitter (e.g., Spindt emitter tip coated with nanoparticles, etc.)

Class 118: Coating Apparatus

pparatus for applying or obtaining a surface coating on a base and/or apparatus for impregnating base materials and takes all such apparatus not provided for in other classes. The coating obtained may be permanent or transitory. The coating may be supplied solely by extraneous materials, as in a painting or waxing operation, or may be supplied wholly or in part by the base materials as in the formation of an oxide coating on a metal base. The coating may consist of an emulsion, dispersion, solution, admixture or oil which is clearly disclosed as leaving a residual film, layer or continuous deposit on the base.

Subclass 715: GAS OR VAPOR DEPOSITION
Subclass 723R: By creating electric field (e.g., gas activation, plasma, etc.)
Subclass 723HC: Hot cathode means for thermionic emission of electrons (e.g., tungsten filament, etc.)
Subclass 724: By means to heat or cool
Subclass 725: Substrate heater
Subclass 730: Rotary

Class 333: Wave Transmission Lines And Networks

Electric wave transmission systems wherein electromagnetic wave energy is guided or constrained by a wave transmission device of the long line type other than loaded lines. Included are passive wave transmission networks simulating the characteristics of a long line wave transmission systems or wave guides, such as artificial lines, delay networks, resonators, impedance matching networks, equalizers, wave filters and transmission line terminations. Passive coupling networks and terminating networks having either lumped or distributed electrical circuit parameters and having impedance characteristics. Smoothing type wave filters having shunt capacitance, or series inductance. Networks including a wave transmission device and means for decreasing the amplitude range of the signal applied to the transmission device as the signal increases in amplitude and means for increasing or restoring the amplitude range of the signal after the transmission over the transmission device. Passive networks for producing an output wave which is the time derivative or time integral of the input wave. Systems including active elements for producing across at least two of the system terminals a negative resistance, and/or an inductance, or capacitance which may be positive or negative. Wave traps using long line elements.

Subclass 1: PLURAL CHANNEL SYSTEMS

Class 331: Oscillators

This is the generic class for electrical oscillators.

Subclass 82: Traveling wave type