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Patent Portfolio for Sale:

Mask and Wafer Pattern Correction Strategy    

Advance pattern correction technology mainly for semiconductor applications

Overview

Portfolio covers powerful, high-speed Pattern Correction Strategies for advanced mask and wafer direct-write applications. Including enabling technologies for superior single and multi-beam Gaussian electron, ion and laser beam pattern generation. Portfolio has been proven in commercially successful pattern generators including single Gaussian electron beam and multiple Gaussian laser beams. Highly cited patents by industry leaders including, Synopsis, Samsung, TSMC

Competitive Advantage

Minimize data volume and upstream data manipulations.
Embed intensive operations where bandwidth is plentiful � in the rasterizer Rasterization, sizing, OPC, dose edge enhancement, etc.
Enhance speed and efficiency by performing correction in parallel with pattern writing.

The seller would like to be granted a license back.

Patent Summary

U.S. Patent Classes & Classifications Covered in this listing:

Class 382: Image Analysis

This is the generic class for apparatus and corresponding methods for the automated analysis of an image or recognition of a pattern. Included herein are systems that transform an image for the purpose of (a) enhancing its visual quality prior to recognition, (b) locating and registering the image relative to a sensor or stored prototype, or reducing the amount of image data by discarding irrelevant data, and (c) measuring significant characteristics of the image.

Subclass 141: Manufacturing or product inspection
Subclass 167: Color correction
Subclass 254: IMAGE ENHANCEMENT OR RESTORATION

Class 716: Data Processing: Design And Analysis Of Circuit Or Semiconductor Mask

This class provides for electrical data processing apparatus and corresponding methods for the following subject matter: for sketching, designing, and analyzing circuit components; for planning, designing, analyzing, and devising a template used for etching circuit pattern on semiconductor wafers.

Subclass 21: Pattern exposure

Class 250: Radiant Energy

This class provides for all methods and apparatus for using, generating, controlling or detecting radiant energy, combinations including such methods or apparatus, subcombinations of same and accessories therefore not classifiable elsewhere.

Subclass 492.1: IRRADIATION OF OBJECTS OR MATERIAL
Subclass 492.2: Irradiation of semiconductor devices
Subclass 492.22: Pattern control

Class 700: Data Processing: Generic Control Systems Or Specific Applications

This class is structured into two main divisions: (1)for the combination of a data processing or calculating computer apparatus (or corresponding methods for performing data processing or calculating operations) AND a device or apparatus controlled thereby, the entirety hereinafter referred to as a "control system". (2)for data processing or calculating computer apparatus (or corresponding methods for performing data processing or calculating operations) wherein the data processing or calculating computer apparatus is designed for or utilized in a particular art device, system, process, or environment, or is utilized for the solution of a particular problem in a field other than mathematics (arithmetic processing per se is classified elsewhere).

Subclass 121: Integrated circuit production or semiconductor fabrication

Class 430: Radiation Imagery Chemistry: Process, Composition, Or Product Thereof

This is the generic class for: (1) Forming the likeness of an object, or an instrumented or discernible phenomenon, in a chemically defined receiver or in a receiver wherein radiation produces a chemical reaction, by use of radiation. (2) Finishing an image by chemical processing regardless how formed. (3) A radiation sensitive receiver, composition, or product disclosed solely for radiation imagery chemistry, and process of making same. (4) A nonradiation sensitive-receiver, composition, or product. (5) An imaged product by a process or employing a receiver, composition, or product.

Subclass 296: Electron beam imaging
Subclass 313: With formation of resist image, and etching of substrate or material deposition

Class 358: Facsimile And Static Presentation Processing

Communication or reproduction of a static image or sequence of static images in which the local light, or density variations composing the image do not vary with time by a method or apparatus involving at least one of the following steps: (1) scanning a static image to capture an image-containing area by resolving it into an area; (2) communication of an image-representative signal or image-representative data over any supporting communication network; or (3) reproduction of an image-containing area in response to an image-representative signal or image-representative image data by reproducing a corresponding image area which at least one of the two dimensions is elemental, simultaneously or in a sequence. In this class, a facsimile system or method is a system or method for the communication or reproduction of an arbitrarily composed image in which the local light, or density variations composing the image do not vary with time, such as documents maps, charts, photographs, etc., but not motion picture film or video.

Subclass 1.2: Size, resolution, or scale control
Subclass 1.9: Attribute control
Subclass 3.01: Multi-level image reproduction (e.g., gray level reproduction)
Subclass 3.06: Halftoning (e.g., a pattern of print elements used to represent a gray level)
Subclass 3.21: Adaptive multi-level image reproduction

Class 347: Incremental Printing Of Symbolic Information

Processes and apparatus for conveying information by selectively creating on a medium a visibly distinguishable symbol or mark composed of a plurality of portions; created portion by portion as, for example, by pixels or dots. The symbol or mark may be an alphanumeric character or an image.

Subclass 19: Measuring and testing (e.g., diagnostics)
Subclass 24: For color