Patent Portfolio for Sale:

Advanced Mask and Wafer Writing Technology    

Advance pattern generatrion technology mainly for semiconductor applications

Overview

Advanced Pattern generation technology offering high speed, scalable and highly accurate patterning solutions. Portfolio enables both single and multiple write beams control (electrons, ions, photons). Highly cited patents by industry leaders, including, KLA-Tencor, Micronic Laser Systems, Toshiba.

Primary Application of the Technology

Generation of advanced patterns for semiconductor and micro-electronics applications.

Competitive Advantage

Portfolio covers powerful, high-speed Writing Strategies for advanced mask and wafer direct-write applications, includes enabling technologies for superior single and multi-beam Gaussian electron, ion and laser beam pattern generation.
Portfolio has been proven in commercially successful pattern generators including single Gaussian electron beam and multiple Gaussian laser beams
Highly cited patents by industry leaders.

Comments on Deal Structure, Potential Terms and Restrictions

Direct sales or licensing

The seller would like to be granted a license back.

The seller may consider selling these patents individually.

Patent Summary

U.S. Patent Classes & Classifications Covered in this Patent Portfolio:

Class 358: Facsimile And Static Presentation Processing

Communication or reproduction of a static image or sequence of static images in which the local light, or density variations composing the image do not vary with time by a method or apparatus involving at least one of the following steps: (1) scanning a static image to capture an image-containing area by resolving it into an area; (2) communication of an image-representative signal or image-representative data over any supporting communication network; or (3) reproduction of an image-containing area in response to an image-representative signal or image-representative image data by reproducing a corresponding image area which at least one of the two dimensions is elemental, simultaneously or in a sequence. In this class, a facsimile system or method is a system or method for the communication or reproduction of an arbitrarily composed image in which the local light, or density variations composing the image do not vary with time, such as documents maps, charts, photographs, etc., but not motion picture film or video.

Subclass 1.8: Dot matrix array (e.g., printheads, etc.)

Class 345: Computer Graphics Processing And Selective Visual Display Systems

Processes and apparatus for selective electrical control of two or more light-generating or light-controlling display elements* in accordance with a received or stored image data signal. The image data includes character, graphical information or display attribute data. The image data may include, for example, information data from a peripheral input device, from the reception of a television signal, from the recognition of image data, or from the generation or creation of image data by a computer.

Subclass 204: DISPLAY DRIVING CONTROL CIRCUITRY
Subclass 206: Having common base or substrate
Subclass 441: Shape generating
Subclass 502: Plural graphics processors
Subclass 690: Intensity or color driving control (e.g., gray scale)

Class 430: Radiation Imagery Chemistry: Process, Composition, Or Product Thereof

This is the generic class for: (1) Forming the likeness of an object, or an instrumented or discernible phenomenon, in a chemically defined receiver or in a receiver wherein radiation produces a chemical reaction, by use of radiation. (2) Finishing an image by chemical processing regardless how formed. (3) A radiation sensitive receiver, composition, or product disclosed solely for radiation imagery chemistry, and process of making same. (4) A nonradiation sensitive-receiver, composition, or product. (5) An imaged product by a process or employing a receiver, composition, or product.

Subclass 296: Electron beam imaging

Class 250: Radiant Energy

This class provides for all methods and apparatus for using, generating, controlling or detecting radiant energy, combinations including such methods or apparatus, subcombinations of same and accessories therefore not classifiable elsewhere.

Subclass 234: Means for moving optical system
Subclass 492.22: Pattern control

Class 347: Incremental Printing Of Symbolic Information

Processes and apparatus for conveying information by selectively creating on a medium a visibly distinguishable symbol or mark composed of a plurality of portions; created portion by portion as, for example, by pixels or dots. The symbol or mark may be an alphanumeric character or an image.

Subclass 233: Plural beam scan
Subclass 239: Specific light modulator
Subclass 241: Specific optical structure
Subclass 256: Specific optical structure

Class 359: Optical: Systems And Elements

Optical elements included in this class are: Lenses; Polarizers; Diffraction gratings; Prisms; Reflectors; Filters; Projection screens; Optical Modulators; Optical Demodulators. Among the optical systems included in this class are: Compound lens systems; Light reflecting signalling systems (e.g., retroreflectors); stereoscopic systems; Binocular devices; Systems of lenticular elements; Systems involving light interference; Glare reducing systems; Light dividing and combining systems; Light control systems (e.g., light valves); building illumination with natural light; Systems for protecting or shielding elements; Optical systems whose operation depends upon polarizing, diffracting, dispersing, reflecting, or refracting light; kaleidoscopes. Further included are certain apertures, closures, and viewing devices of a specialized nature which involve no intentional reflection, refraction, or filtering of light rays. This class also includes optical elements combined with another type of structure(s) to constitute an optical element combined with a nonoptical structure or a perfection or improvement in the optical element.

Subclass 197: Using a periodically moving element (periodic change of optically reflecting, refracting or diffracting element)
Subclass 204: Utilizing plural light beams