Patent Portfolio for Sale:

Electron Beam Direct Writing of Semiconductor Wafers    

apparatus and method of direct e-beam write of semiconductor wafers

Overview

Portfolio of electron beam lithography system and method using either single or multiple micro-columns beams for direct writing of semiconductor wafers. This is accomplished by assuring very tight control of the beam shape, the stage carrying the semiconductor wafer, the raster scan of the beam, dose modulation and pixel deflection, etc.

Comments on Deal Structure, Potential Terms and Restrictions

Seller may want to have a back license of the technology

Patent Summary

U.S. Patent Classes & Classifications Covered in this listing:

Class 250: Radiant Energy

This class provides for all methods and apparatus for using, generating, controlling or detecting radiant energy, combinations including such methods or apparatus, subcombinations of same and accessories therefore not classifiable elsewhere.

Subclass 398: With target means
Subclass 492.2: Irradiation of semiconductor devices
Subclass 492.22: Pattern control

Class 430: Radiation Imagery Chemistry: Process, Composition, Or Product Thereof

This is the generic class for: (1) Forming the likeness of an object, or an instrumented or discernible phenomenon, in a chemically defined receiver or in a receiver wherein radiation produces a chemical reaction, by use of radiation. (2) Finishing an image by chemical processing regardless how formed. (3) A radiation sensitive receiver, composition, or product disclosed solely for radiation imagery chemistry, and process of making same. (4) A nonradiation sensitive-receiver, composition, or product. (5) An imaged product by a process or employing a receiver, composition, or product.

Subclass 296: Electron beam imaging