Industrial Electronics : Test & Measurement

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Patents & Technology Available

Number of Technology Available listing in this topic: 196

Data converter apparatus and method particularly useful for a database-to-object inspection system
Data converter apparatus for converting in real time data stored in an input compact format into an output expanded real time format.   > view
Process inspection using full and segment waveform matching
Method for monitoring photolithographic processing carried out on a semiconductor substrate, particularly for inspecting the cross-sectional profile of a feature formed on the ...  > view
Straight line defect detection tool
The technology has particular applicability for in-line inspection of reticles with submicron design features.   > view
Automatic field sampling for CD measurement
A method and apparatus is provided for inspecting a semiconductor wafer for field-to-field critical dimension (CD) variations using statistical techniques....  > view
Feature-based defect detection
Detection of defects in patterned substrates, such as semiconductor wafers, particularly based on features in voltage-contrast images.   > view
Photolithography monitoring using a golden image
A method for monitoring the focus-exposure settings of a stepper in a photolithography process.  > view
Dimension error detection in object
In a system for real-time inspection of patterns formed on a base, the pattern including surfaces and edges. The system provides for a ...  > view
Method for detecting particles using illumination with several wavelengths
A system for the detection of very small particles on patterned or bare surfaces, particularly of semiconductor wafers.   > view
Cluster tool
A cluster tool for testing substrates and locating defects on the substrates utilizing a plurality of tools coupled via an automation platform.   > view
Method for reticle inspection using aerial imaging
A techniques for inspecting reticles that are used in fabricating microelectronic devices through a microphotolithographic process.  > view
System for microscopic inspection of articles
System for detecting defects in a VLSI reticle by comparison to a reference.  > view
Endpoint detection for semiconductor processes
A substrate 20 in a process chamber 42 is processed at process conditions suitable for processing a layer 30 on the substrate 20...  > view
Private Listing: Number 7124
The owner of this listing has requested that patent numbers, descriptions and other information be provided only to qualifying buyers under confidentiality agreement. ...  > view
Private Listing: Number 7102
The owner of this listing has requested that patent numbers, descriptions and other information be provided only to qualifying buyers under confidentiality agreement. ...  > view
Private Listing: Number 7100
The owner of this listing has requested that patent numbers, descriptions and other information be provided only to qualifying buyers under confidentiality agreement. ...  > view
Private Listing: Number 7030
The owner of this listing has requested that patent numbers, descriptions and other information be provided only to qualifying buyers under confidentiality agreement. ...  > view
Private Listing: Number 6985
The owner of this listing has requested that patent numbers, descriptions and other information be provided only to qualifying buyers under confidentiality agreement. ...  > view
Private Listing: Number 6524
The owner of this listing has requested that patent numbers, descriptions and other information be provided only to qualifying buyers under confidentiality agreement. ...  > view
Private Listing: Number 6472
The owner of this listing has requested that patent numbers, descriptions and other information be provided only to qualifying buyers under confidentiality agreement. ...  > view
Private Listing: Number 6471
The owner of this listing has requested that patent numbers, descriptions and other information be provided only to qualifying buyers under confidentiality agreement. ...  > view