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Listing Number: 1038

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Integrated Circuits

Process control

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1 Issued Patent - US
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Patent for Sale

Pattern generation method and apparatus using cached cells of hierarchical data

Pattern generation method and apparatus using cached cells of hierarchical data


Overview

 

A pattern generation method and system in which hierarchical image data (determining a pattern to be imaged on a target) is received at a graphics engine having a memory, at least one cell determining a repeated feature or set of features of the pattern is stored in the memory, and beam control data is generated in response to the image data. The image data includes residual data including at least two subroutine call commands for each cell stored in the memory. In response to each subroutine call command, the graphics engine retrieves a cell (identified by the command) from the memory, and asserts beam control data that determines a feature or feature set determined by the cell to be imaged at (or beginning at) a location on the target identified by the command. The subroutine call commands can be distributed throughout the image data, including in at least one cell to be cached as well as in the residual data. Preferably, the graphics engine caches each cell of the image data.

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Patent Summary

U.S. Patent Classes & Classifications Covered in this Patent:

Class 250: Radiant Energy

This class provides for all methods and apparatus for using, generating, controlling or detecting radiant energy, combinations including such methods or apparatus, subcombinations of same and accessories therefore not classifiable elsewhere.

Subclass 492.22: Pattern control
Subclass 492.23: Variable beam

Class 700: Data Processing: Generic Control Systems Or Specific Applications

This class is structured into two main divisions: (1)for the combination of a data processing or calculating computer apparatus (or corresponding methods for performing data processing or calculating operations) AND a device or apparatus controlled thereby, the entirety hereinafter referred to as a "control system". (2)for data processing or calculating computer apparatus (or corresponding methods for performing data processing or calculating operations) wherein the data processing or calculating computer apparatus is designed for or utilized in a particular art device, system, process, or environment, or is utilized for the solution of a particular problem in a field other than mathematics (arithmetic processing per se is classified elsewhere).

Subclass 119: Rapid prototyping (e.g., layer-by-layer, material deposition)

Class 716: Data Processing: Design And Analysis Of Circuit Or Semiconductor Mask

This class provides for electrical data processing apparatus and corresponding methods for the following subject matter: for sketching, designing, and analyzing circuit components;  for planning, designing, analyzing, and devising a template used for etching circuit pattern on semiconductor wafers.

Subclass 19: DESIGN OF SEMICONDUCTOR MASK

 

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