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Listing Number: 1037

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Related Topics

Integrated Circuits

Transformers, Conductors & Inductors

Heat, Vent. & Air Con.

Solid State

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 Intellectual Property

2 Issued Patents - US
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Patent Portfolio for Sale

Method and apparatus for removal of surface contaminants.

Method and apparatus for removal of surface contaminants from substrates in vacuum applications.


Overview

 

A method and apparatus for removal of volatile contaminants from substrate surfaces before the substrate enters a process chamber. Substrate cleaning is achieved by irradiating the substrate with a low-energy electron beam. The interaction of the electrons in the beam with the contaminants present on the surface of the substrate causes evaporation of low vapor pressure species which can be deposited on the surface. A cryoshield pumps the evaporated species. After evaporation and pumping, the substrate passes through a glow discharge chamber wherein the negative surface charge created by the electron beam is neutralized using positive ions. The inventive apparatus can be configured so that no separate vacuum chamber is needed to prepare the substrate.

Primary Application of the Technology

Semiconductor wafer cleaining

Other Potential Applications

Cleaning substrates for Material processing

Comments on Deal Structure, Potential Terms and Restrictions

Seller wants license back of the technology

Patent Summary

U.S. Patent Classes & Classifications Covered in this Patent Portfolio:

Class 239: Fluid Sprinkling, Spraying, And Diffusing

The general class for claims pertaining to the spraying, sprinkling, or scattering of fluids or fluent solids either in the form of slurries or as dry material, over an extended area on a surface, including - weather control or modification, diffusers, fountains, drinking tubes and straw, dry pulverulent material, terminal fluid handling elements and orifice shapes.

Subclass 1: PROCESSES
Subclass 499: Chamber-like deflector
Subclass 524: Transverse planar or dished surface type

Class 454: Ventilation

This is the parent class for apparatus and processes for supplying air to and removing it from enclosures, for distributing and circulating the air therein, or for preventing its contamination.

Subclass 310: Concentric

Class 438: Semiconductor Device Manufacturing: Process

This class provides for manufacturing a semiconductor containing a solid-state device for the following purposes: (a) conducting or modifying an electrical current, (b) storing electrical energy for subsequent discharge within a microelectronic integrated circuit, or (c) converting electromagnetic wave energy to electrical energy or electrical energy to electromagnetic energy.  Also operations involving: (1) coating a substrate with a semiconductive material, or (2) coating a semiconductive substrate or substrate containing a semiconductive region. It also provides for operations involving etching a semiconductive substrate or etching a substrate containing a semiconductive region. The class provides for packaging or treatment of packaged semiconductor.

Subclass 473: By implanting or irradiating
Subclass 795: RADIATION OR ENERGY TREATMENT MODIFYING PROPERTIES OF SEMICONDUCTOR REGION OF SUBSTRATE (E.G., THERMAL, CORPUSCULAR, ELECTROMAGNETIC, ETC.)

Class 257: Active Solid-State Devices (E.G., Transistors, Solid-State Diodes)

This class provides for active solid-state electronic devices, that is, electronic devices or components that are made up primarily of solid materials, usually semiconductors, which operate by the movement of charge carriers - electrons or holes - which undergo energy level changes within the material and can modify an input voltage to achieve rectification, amplification, or switching action, and are not classified elsewhere.

Subclass E21.226: Dry cleaning (EPO)

 

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