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Electronic Engineering : Cybernetics
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Number of Technology Available listing in this topic: 5
Apparatus for electro-chemical deposition with thermal anneal chamber
An electro-chemical deposition system that is designed with a flexible architecture that is expandable to accommodate future designs rules and gap fill requirements ... > view
An electro-chemical deposition system that is designed with a flexible architecture that is expandable to accommodate future designs rules and gap fill requirements ... > view
Pixel Based Machine for Patterned Wafers
A method is provided for the detection of defects on a semiconductor wafer by checking individual pixels on the wafer... > view
A method is provided for the detection of defects on a semiconductor wafer by checking individual pixels on the wafer... > view
Feature-based defect detection
Detection of defects in patterned substrates, such as semiconductor wafers, particularly based on features in voltage-contrast images. > view
Detection of defects in patterned substrates, such as semiconductor wafers, particularly based on features in voltage-contrast images. > view
Method and apparatus for priority based scheduling of wafer processing within a multiple chamber processing tool
a multiple chamber wafer processing system - method and apparatus for scheduling processing for a semiconductor wafer within a multiple chamber semiconductor wafer ... > view
a multiple chamber wafer processing system - method and apparatus for scheduling processing for a semiconductor wafer within a multiple chamber semiconductor wafer ... > view
Thermal CVD/PECVD reactor
A high pressure, high throughput, single wafer, semiconductor processing reactor > view
A high pressure, high throughput, single wafer, semiconductor processing reactor > view