Global Patent Exchange
Business Machines : ScanningSign up for an email alert when new listing are posted, or subscribe to our RSS feed.
Can’t find what you are looking for? Create your own topic - register for a Tynax Account, and Create a Saved Search.
Email Alert
RSSPatents & Technology Wanted
Number of Technology Wanted listing in this topic: 2
LED, Laser & Inkjet Printing Patents
Buying patents related to the print engine, consumable supplies and all aspects of modern computer printing. > view
Buying patents related to the print engine, consumable supplies and all aspects of modern computer printing. > view
Digital Pathology Inventions and Technologies
Image-based information environment enabled by computer technology that allows for the management of information generated from a digital slide. > view
Image-based information environment enabled by computer technology that allows for the management of information generated from a digital slide. > view
Patents & Technology Available
Number of Technology Available listing in this topic: 86
Miniature High-Resolution Printer
Compact, next-generation Laser/LED design enables substantial reductions in printing costs. > view
Compact, next-generation Laser/LED design enables substantial reductions in printing costs. > view
New CapillaroscopeMicroscope that permits visual examination of the living capillaries in nail beds, skin, and conjunctiva. With a grasping means that improves precission and ... > view
Inkjet Patents and Technologies for Low-Cost Display Manufacture & Other Applications
High-precision inkjet patents and technologies from World-class R&D group. > view
High-precision inkjet patents and technologies from World-class R&D group. > view
Multi-Beam Patent Portfolio for Accurate High-Speed Placement and Overlay
Field-proven technologies for correcting critical dimension errors including uniformity and linearity errors arising from multiple sources with an emphasis on real-time computations during ... > view
Field-proven technologies for correcting critical dimension errors including uniformity and linearity errors arising from multiple sources with an emphasis on real-time computations during ... > view
Multiple Electron-Beam Writing to Mask and Wafer
Field-proven technologies for correcting critical dimension errors including uniformity and linearity errors arising from multiple sources with an emphasis on real-time computations during ... > view
Field-proven technologies for correcting critical dimension errors including uniformity and linearity errors arising from multiple sources with an emphasis on real-time computations during ... > view