Technologies Available: MEMS

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Semiconductor Chip & MEMs Manufacturing
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RF MEMS Technology, IPs & Patents divestiture
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Semiconductor Device Manufacturing Patent
A new technique for dry etching a solid surface.... more

Integrated MEMS Fabrication Methods
Integrated fabrication steps to produce stiction free MEMS devices... more

Digital Light Processing (DLP) Micromirror Patent Portfolio
MEMS Device Design & Manufacturing IP for Rear Projection TV, HDTV & other Projector Displays... more

Micro-ElectroMechanical System (MEMS) Device Patent
Wireless & RF Switching Device Design & Manufacturing ... more

Improved control over the dimensions of a patterned photo-resist
Control over the dimensions of a patterned photo-resist to better control the critical dimensions of fabricated devices... more

Production worthy, non-destructive diagnostics of thin films using carrier illumination technique
Non-contact, fully automated carrier illumination technology utilizing a pump-probe laser configuration is used to characterize dopant depth and concentration of thin films.... more

Enhanced edge resolution and critical dimension linearity in lithography
A semiconductor fabrication gray level photolithography strategy, in which the energy beam intensities corresponding to each gray level are selected from a set of non-linear, non-monotonic intensities... more

Method and Apparatus for Inspection of Patterned Semiconductor Wafers
A method and apparatus for inspecting a wafer surface to detect the presence of exposed conductive material...... more

Method for reticle inspection using aerial imaging
A techniques for inspecting reticles that are used in fabricating microelectronic devices through a microphotolithographic process.... more

Multiphase printing for E-beam lithography
A method for a raster scan particle or light beam lithography system for writing in multiple passes interleaved in such a manner as to achieve a composite result nearly identical to normal single pass... more

Self-cleaning etch process
A process for etching a substrate 25 in an etching chamber 30, and simultaneously cleaning a thin, non-homogeneous, etch residue deposited on the surfaces of the walls 45...... more

Process used in an RF coupled plasma reactor
A domed plasma reactor chamber uses an antenna driven by RF energy (LF, MF, or VHF) which is inductively coupled inside the reactor dome. ... more

Apparatus and method for cleaning of semiconductor process chamber surfaces
A temperature-controlled ceramic liner or barrier is used adjacent to process chamber surfaces during a plasma-comprising process...... more

Selectivity for etching an oxide over a nitride
A method of etching an oxide over a nitride with high selectivity comprising plasma etching ... more

Method and apparatus for protection of conductive surfaces in a plasma processing reactor
An apparatus and method for protecting conductive, typically metallic, walls of a plasma process chamber from accumulation of contaminants ... more

Technical problems materials, robotics and other areas--if you have them, please let us know!
Large R&D organization with wide range of advanced solutions looking for problems to solve... more

Private Listing Number 1834
The owner of this listing has requested that patent numbers, descriptions and other information be provided only to qualifying buyers under confidentiality agreement.Please review the patent class info... more

Private Listing Number 1831
The owner of this listing has requested that patent numbers, descriptions and other information be provided only to qualifying buyers under confidentiality agreement.Please review the patent class info... more

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